Conference and Venue Introduction

Alain C. Diebold
“Welcome to ICSE-V and the College of Nanoscale Science and Engineering at SUNY-Albany”

Plenary Presentations

Hans Arwin, Linkoping University, Sweden
“Application of ellipsometry techniques to biological materials”

Rasheed M.A. Azzam, University of New Orleans, USA
“The intertwined history of polarimetry and ellipsometry”

Bernard Drevillon, Ecole Polytechnique, France
“Polarization modulation ellipsometry and polarimetry”

Dean Levi, National Renewable Energy Laboratory, USA
“Ellipsometry and related complementary analysis of photovoltaic materials and devices”

Maria Losurdo, University of Bari, Italy
"Applications of Ellipsometry in Nanoscale Science: Needs, Status, Achievements and Future Challenges"

Wrap-up Session

Chair: David E. Aspnes, North Carolina State University, USA
“Panel discussion: conference wrap-up”

Invited Presentations

A list of about 20 invited speakers has been contacted.  Among those who have confirmed include:


Eric Adles, University of Maryland -- Baltimore County, USA
"Use of real time ellipsometry to understand and control the chemistry of ZnO growth by MOCVD"

Ilsin An, Hanyang University, Korea
"Vacuum UV multichannel ellipsometry: instrumentation and applications"

Antonello de Martino, Ecole Polytechnique Palaiseau, France
"Development and applications of Mueller polarimetry"

Miklos Fried, Research Inst. for Technical Physics and Materials Science, Hungary
“Expanded beam ellipsometry”

Hiroyuki Fujiwara, Gifu University, Japan
"Spectroscopic ellipsometry characterization of silicon thin-film solar cells".

Thomas Germer, NIST, Gaithersburg, USA
"Light scattering ellipsometry"

Kurt Hingerl, University of Linz, Austria
"Photonics of two-dimensional metamaterials"

Karsten Hinrichs, ISAS – Berlin, Germany
“In-situ IR ellipsometry of solid/liquid interfaces”

Tino Hofmann, University of Nebraska, USA
"Variable-wavelength frequency-domain THz ellipsometry"

Gang Jin, Chinese Academy of Science - Beijing, China
"Development of biosensor based on imaging ellipsometry and biomedical applications"

Erwin Kessels, Eindhoven University of Technology, The Netherlands
“Real time optical probes of ALD and CVD thin films for c-Si photovoltaics”

Hiroshi Nomura, Toshiba Corporation, Japan
"Polarimetric diagnosis of 193-nm lithography equipment"

Jon Opsal
"Industrial applications of ellipsometry for metrology"

Lee Richter, NIST, Gaithersburg, USA
"Linear and nonlinear optical studies of oriented polymer thin films"

Garth Simpson, Purdue University, USA
"Non-linear optical Stokes ellipsometry for materials characterization"

Andrei Sirenko, New Jersey Institute of Technology, USA
"Synchrotron radiation-based far infrared ellipsometry"